The PELIICAEN  (Platform for the Study of Ion Implantation Controlled and Analyzed at the Nanometric Scale) setup is able to produce focused mono and multiply charged ions beam from a dedicated ECRIS (Electron Cyclotron Resonance Ion Source). The system can provide a broad range of species (H to Bi) and kinetic energies (from 2 to more than 500 keV), up to middle range charge states (Ar8+, Bi17+), focused down to a mask less 100 nm spot size .
The apparatus includes different types of in-situ microscopes such as a SEM (Scanning Electron Microscope) and a SPM (Scanning Probe Microscopies) in Ultra High Vacuum environment below 10-9 mbar and detectors such as MCP (Multi Channel Plate) or SED (Secondary Electron Detector).
In addition, we developed an ultra-high-performance pulser that allows us to erase the beams in situ, without any tail, with repetition rates up to 1 MHz, thus enabling us to use these focused beams for time-of-flight measurements and to move towards single ion implantation at high repetition rates.
I will present performances and some results obtained with the apparatus and show that by using all these means, localized doping is possible for applications in quantum science and technologies.
 S. Guillous et al., “A new setup for localized implantation and live-characterization of keV energy multiply charged ions at the nanoscale,” Rev. Sci. Instrum. 87, 113901 (2016).
 Mathieu Lalande et al., “Nanoscale multiply charged focused ion beam platform for surface modification, implantation and analysis”, Rev. Sci. Instrum. 93, 043703 (2022)