T. Richter, P. Mazarov
Raith GmbH, Konrad-Adenauer-Allee 8, 44263 Dortmund, Germany
Focused Ion Beams (FIB) are broadly usedinapplications related to nanoscale science,and they are inherentlyappliedfor direct nano-patterning, fabrication of smallest features and sample functionalizationat high fidelity.Various ionspeciesare emitted simultaneously from Liquid Metal Alloy Ion Source (LMAIS)separated subsequently in an ExB filter.Thisemerging FIB source technology provides a versatile solution to deliver differentionspeciesfrom a single source for manifoldapplicationssuch as FIB implantation or sample modification for subsequentprocesses.In this contribution we introducea FIB-SEM tool involving LMAIS FIB technology ona lithographyplatform enabling multiple ion implantation processpathways.We will discuss advantages of GaBiLiand AuGeSi as universal ion sources providing light and heavy ions from a single Liquid Metal Alloy Ion Source (LMAIS). Related applicationsand workflows will be presented. Furthermore, we give an overview about recent investigations of permalloy filmpatterning using Dysprosiumions from LMAISfor local damping of magnetization.
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L. Bischoff, N. Klingner, P. Mazarov, W. Pilz, and F. Meyer, Dysprosium Liquid Metal Alloy Ion Source For Magnetic Nanostructures, J. Vac. Sci. Technol. B (accepted for publication, 2022).